David Krick
David Krick
blanks cleaning deal great mask ready remains tasks work
A great deal of work still remains for getting EUV mask blanks ready for manufacturing, but our cleaning methodology has removed another barrier. We are well positioned for the tasks ahead.
cleaning critical defects generating mask necessary ruins step
Cleaning of defects is a critical and necessary step in generating a zero-defect mask blank, because defects in the substrate become defects in the multilayer, which ruins the mask blank.